Method of varying template dimensions to achieve alignment during imprint lithography
AssigneeBoard of Regents, The University of Texas Systems
InventorsSidlgata V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
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Abstract
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
Claims30
A method of aligning a template having template alignment marks and a substrate having substrate alignment marks, said method comprising:
- locating a liquid between said template and said substrate;
- placing said template and said substrate in superimposition;
- and
- varying dimensions of said template to obtain a desired spatial relation between said template alignment marks and said substrate alignment marks concurrently with said template being in contact with a portion of said liquid.
A method of aligning a template having template alignment marks and a substrate having substrate alignment marks, said method comprising:
- locating a liquid between said template and said substrate;
- placing said template and said substrate in superimposition;
- varying dimensions of said template to obtain a desired spatial relation between said template alignment marks and said substrate alignment marks by applying a plurality of forces to said template, concurrently with said template being in contact with a portion of said liquid;
- and
- impinging actinic radiation upon said liquid to solidify said liquid.
A method of aligning a template having template alignment marks and a substrate having substrate alignment marks, said method comprising:
- placing said template and said substrate in superimposition;
- and
- controlling thermal properties of said substrate and said template to obtain a desired spatial relation between said template alignment marks and said substrate alignment marks.
Dependencies are inferred from the claim text.