Ion beam milling system and method for electron microscopy specimen preparation

An ion beam milling system for electron microscopy specimen preparation comprising:

• a chamber communicating with a source of vacuum for said chamber, a specimen holder, a specimen having length and thickness dimensions, said specimen mounted to said specimen holder, and an ion beam masking member comprising a fiber having a length substantially equal to the length of said specimen secured to a surface comprising the thickness dimension of said specimen such that there is no relative movement between said specimen and said ion beam masking member during milling, and at least one ion gun positioned to cause milling of said surface of said specimen to provide an electron transparent surface of said specimen adjacent said ion beam masking member.

An ion beam milling system as claimed in 13 including a controller for controlling the power supplied to said at least one ion generating gun.

An ion beam milling system for electron microscopy specimen preparation comprising:

• a chamber communicating with a source of vacuum for said chamber, a specimen holder, a specimen having height, length, and thickness dimensions mounted on said specimen holder, and an ion beam masking member secured to a surface comprising the length dimension of said specimen adjacent an edge thereof such that there is no relative movement between said specimen and said ion beam masking member during milling, and at least one ion gun positioned to cause milling of said surface of said specimen to expose an area of interest on said specimen adjacent said ion beam masking member.

An ion beam milling system for electron microscopy specimen preparation comprising:

• a chamber communicating with a source of vacuum for said chamber, a specimen holder, a specimen having height, length, and thickness dimensions mounted on said specimen holder, and an ion beam masking member a fiber having a length substantially equal to the length of said specimen secured to a surface comprising the length dimension of said specimen adjacent an edge thereof such that there is no relative movement between said specimen and said ion beam masking member during milling, and at least one ion gun positioned to cause milling of said surface of said specimen to expose an area of interest on said specimen adjacent said ion beam masking member.

An ion beam milling system as claimed in 18 including a controller for controlling the power supplied to said ion generating guns gun.

An ion beam milling system for electron microscopy specimen preparation comprising:

• a chamber communicating with a source of vacuum for said chamber, a specimen holder, a specimen having length and thickness dimensions, said specimen mounted to said specimen holder, and an ion beam masking member secured with an adhesive to a surface comprising the thickness dimension of said specimen such that there is no relative movement between said specimen and said ion beam masking member during milling, and at least one ion gun positioned to cause milling of said surface of said specimen to provide an electron transparent surface of said specimen adjacent said ion beam masking member.

An ion beam milling system for electron microscopy specimen preparation comprising:

• a chamber communicating with a source of vacuum for said chamber, a specimen holder, a specimen having length and thickness dimensions, said specimen mounted to said specimen holder, and an ion beam masking member mechanically attached to a surface comprising the thickness dimension of said specimen such that there is no relative movement between said specimen and said ion beam masking member during milling, and at least one ion gun positioned to cause milling of said surface of said specimen to provide an electron transparent surface of said specimen adjacent said ion beam masking member.

An ion beam milling system for electron microscopy specimen preparation comprising:

• a chamber communicating with a source of vacuum for said chamber, a specimen holder, a specimen having height, length, and thickness dimensions mounted on said specimen holder, and an ion beam masking member secured with an adhesive to a surface comprising the length dimension of said specimen adjacent an edge thereof such that there is no relative movement between said specimen and said ion beam masking member during milling, and at least one ion gun positioned to cause milling of said surface of said specimen to expose an area of interest on said specimen adjacent said ion beam masking member.

An ion beam milling system for electron microscopy specimen preparation comprising:

• a chamber communicating with a source of vacuum for said chamber, a specimen holder, a specimen having height, length, and thickness dimensions mounted on said specimen holder, and an ion beam masking member mechanically attached to a surface comprising the length dimension of said specimen adjacent an edge thereof such that there is no relative movement between said specimen and said ion beam masking member during milling, and at least one ion gun positioned to cause milling of said surface of said specimen to expose an area of interest on said specimen adjacent said ion beam masking member.

In combination an electron microscopy specimen having length and thickness dimensions, and an ion beam masking member secured to a surface comprising the thickness dimension of said specimen such that there is no relative movement between said specimen and said ion beam masking member during milling of said specimen to provide an electron transparent surface of said specimen adjacent said ion beam masking member.