Methods of fabricating metallic materials
AssigneeHoneywell International Inc.
InventorsVladimir M. Segal, Stephane Ferrasse, Frank Alford
Life of this patent
Estimating the term…
Abstract
The invention includes a physical vapor deposition target composed of a face centered cubic unit cell metal or alloy and having a uniform grain size less than 30 microns, preferably less than 1 micron; and a uniform axial or planar <220> texture. Also described is a method for making sputtering targets. The method can comprise billet preparation; equal channel angular extrusion with a prescribed route and number of passes; and cross-rolling or forging subsequent to the equal channel angular extrusion.
Claims17
A method of fabricating a metallic material having a face centered cubic unit cell, comprising:
- extruding the metallic material a sufficient number of times to create a substantially random crystallographic orientation distribution within the material;
- and
- after the extruding, cross-rolling the material and subsequently forging the material to induce a predominate <220> crystallographic texture within the material.
Dependencies are inferred from the claim text.