Method for processing one-dimensional nano-materials
AssigneeHon Hai Precision Ind. Co., Ltd.
InventorsLiang Liu, Shoushan Fan
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AssigneeHon Hai Precision Ind. Co., Ltd.
InventorsLiang Liu, Shoushan Fan
Estimating the term…
A method for processing one-dimensional nano-materials includes the following steps: providing a substrate (11); forming one-dimensional nano-materials (12) on the substrate, the one-dimensional nano-materials being substantially parallel to each other and each being substantially perpendicular to the substrate, the one-dimensional nano-materials cooperatively defining a top surface distal from the substrate; and applying physical energy (14) by means of a high-energy pulse laser beam to the top surface of the one-dimensional nano-materials. The resulting one-dimensional nano-materials have sharp, tapered tips (15, 15′). Distances between adjacent tips are approximately uniform, and are relatively large. This reduces shielding between adjacent one-dimensional nano-materials. The tips also contribute to a decreased threshold voltage required for field emission by the one-dimensional nano-materials.
A method for processing one-dimensional nano-materials, comprising the following steps:
A method for processing nano-materials, comprising the steps of:
A method for making a field emission device, comprising the steps of:
A method for processing one-dimensional nano-materials, comprising the following steps:
Dependencies are inferred from the claim text.