Methods and systems for determining a critical dimension and overlay of a specimen

A method for determining at least two properties of a specimen, comprising:

• disposing the specimen upon a stage, wherein the stage is coupled to a measurement device, and wherein the measurement device comprises an illumination system and a detection system;
• directing energy toward an upper surface and a bottom surface of the specimen using the illumination system;
• detecting energy propagating from the upper surface and the bottom surface of the specimen using the detection system;
• generating one or more output signals responsive to the detected energy;
• and
• processing the one or more output signals to determine a first property, a second property, and a third property of the specimen, wherein the first property comprises a critical dimension of the specimen, wherein the second property comprises overlay misregistration of the specimen, and wherein the third property comprises a presence of defects on the bottom surface of the specimen.

A computer-implemented method for controlling a system configured to determine at least two properties of a specimen during use, wherein the system comprises a measurement device, comprising:

• controlling the measurement device, wherein the measurement device comprises an illumination system and a detection system, and wherein the measurement device is coupled to a stage, comprising:
• controlling the illumination system to direct energy toward an upper surface and a bottom surface of the specimen;
• controlling the detection system to detect energy propagating from the upper surface and the bottom surface of the specimen;
• and
• generating one or more output signals responsive to the detected energy;
• and
• processing the one or more output signals to determine a first property, a second property, and a third property of the specimen, wherein the first property comprises a critical dimension of the specimen, wherein the second property comprises overlay misregistration of the specimen, and wherein the third property comprises a presence of defects on the bottom surface of the specimen.

A method for fabricating a semiconductor device, comprising;

• forming a portion of the semiconductor device upon a specimen;
• disposing the specimen upon a stage, wherein the stage is coupled to a measurement device, and wherein the measurement device comprises an illumination system and a detection system;
• directing energy toward an upper surface and a bottom surface of the specimen using the illumination system;
• detecting energy propagating from the upper surface and the bottom surface of the specimen using the detection system;
• generating one or more output signals responsive to the detected energy;
• and
• processing the one or more output signals to determine a first property, a second property, and a third property of the specimen, wherein the first property comprises a critical dimension of the portion of the semiconductor device, wherein the second property comprises overlay misregistration of the portion of the semiconductor device, and wherein the third property comprises a presence of defects on the bottom surface of the specimen.

A system configured to determine a least two properties of a specimen during use, comprising:

• a stage configured to support the specimen during use;
• a measurement device coupled to the stage, comprising:
• an illumination system configured to direct energy toward an upper surface of the specimen during use and to direct energy toward a bottom surface of the specimen during use;
• and
• a detection system coupled to the illumination system and configured to detect energy propagating from the upper surface of the specimen during use and to detect energy propagating from the bottom surface of the specimen during use, wherein the measurement device is configured to generate one or more output signals in response to the detected energy during use;
• a local processor coupled to the measurement device and configured to at least partially process the one or more output signals during use;
• and
• a remote controller computer coupled to the local processor, wherein the remote controller computer is configured to receive the at least partially processed one or more output signals and to determine a first property, a second property, and a third property of the specimen from the at least partially processed one or more output signals during us, wherein the first property comprises a critical dimension of the specimen, wherein the second property comprises overly misregistration of the specimen, and wherein the third property comprises a presence of defects on the bottom surface of the specimen.

A method for determining at least two properties of a specimen, comprising:

• disposing the specimen upon a stage, wherein the stage is coupled to a measurement device, and wherein the measurement device comprises an illumination system and a detection system;
• directing energy toward an upper surface and a bottom surface of the specimen using the illumination system;
• detecting energy propagating from the upper surface and the bottom surface of the specimen using the detection system;
• generating one or more output signals in response to the detected energy;
• and
• processing the one or more output signals to determine a first property, a second property, and a third property of the specimen, wherein the first property comprises a critical dimension of the specimen, wherein the second property comprises overlay misregistration of the specimen, and wherein the third property comprises a presence of defects on the bottom surface of the specimen, wherein processing the one or more output signals comprises:
• at least partially processing the one or more output signals using a local processor, wherein the local processor is coupled to the measurement device;
• sending the at least partially processed one or more output signals from the local processor to a remote controller computer;
• and
• further processing the at least partially processed one or more output signals using the remote controller computer.

A system configured to determine at least three properties of a specimen during use, comprising:

• a stage configured to support the specimen during use;
• a measurement device coupled to the stage, comprising:
• an illumination system configured to direct energy toward a surface of the specimen during use;
• and
• a detection system coupled to the illumination system and configured to detect energy propagating from the surface of the specimen during use, wherein the measurement device is configured to generate one or more output signals in response to the detected energy during use;
• and
• a processor coupled to the measurement device and configured to determine the at least three properties of the specimen from the one or more output signals during use, wherein the at least three properties comprise a critical dimension of the specimen, overlay misregistration of the specimen, and a flatness measurement of the specimen.

A system configured to determine at least three properties of a specimen during use, comprising:

• a process tool configured to process the specimen during use;
• a measurement device coupled to the process tool, comprising:
• an illumination system configured to direct energy toward a surface of the specimen during use;
• and
• a detection system coupled to the illumination system and configured to detect energy propagating from the surface of the specimen during use, wherein the measurement device is configured to generate one or more output signals in response to the detected energy during use;
• and
• a processor coupled to the measurement device and configured to determine the at least three properties of the specimen from the one or more output signals during use, wherein the at least three properties comprise a critical dimension of the specimen, overlay misregistration of the specimen, and a roughness of the specimen, a roughness of a layer on the specimen, or a roughness of a feature on the specimen.

A system configured to determine at least three properties of a specimen during use, comprising:

• a lithography track configured to perform one or more steps of a lithography process on the specimen during use;
• a measurement device coupled to the lithography track, wherein the measurement device is configured to generate one or more output signals responsive to the at least three properties of the specimen during use;
• and
• a processor coupled to the measurement device, wherein the processor is configured to determine the at least three properties of the specimen from the one or more output signals during use, and wherein the at least three properties of the specimen comprise a critical dimension of the specimen, overlay misregistration of the specimen, and a presence of defects on a bottom surface of the specimen.