Exposure apparatus and exposure method

An exposure apparatus, comprising:

• an illumination optical system for illuminating an original with exposure light output from a light source;
• a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate;
• a photodetector disposed in said illumination optical system, for detecting a quantity of light illuminating the original;
• control means for controlling the exposure light output from the light source on the basis of the output of the photodetector;
• and
• correcting means for reducing an influence of reflection light from the original, on the basis of the output the photodetector as the original is illuminated by the illumination optical system, while excluding influence of a reflection light component.

A scan type exposure apparatus, comprising:

• an illumination optical system for illuminating an original, in a predetermined shape, with light from a light source;
• a projection optical system for projecting a pattern of the original, illuminated by said illumination optical system, onto a substrate;
• a photodetector disposed inside said illumination optical system, for detecting a quantity of illumination light in said illumination optical system and for providing an output of illumination light quantity information in relation to each operative position in scan motion;
• first control means for controlling output of the light source in accordance with each output of said photodetector;
• storing means for reducing or removing, in relation to different positions on the original illuminated in the predetermined shape, a component of reflection light from the original included in the photodetector output, and for holding correction information for calculation of an illumination light quantity solely from the light source;
• calculating means for receiving correction information held by said storing means and for receiving illumination light quantity information from said photodetector in each operative position in the scan motion, to calculate, in accordance with the correction information, information on illumination light quantity solely from the light source, without being influenced by the reflection light component;
• and
• second control means for receiving the information of illumination light quantity solely from the light source, calculated by said calculating means, to control output of exposure light from the light source so that, at each operative position in the scan motion, the illumination light quantity solely from the light source is kept at a predetermined value.

A scan type exposure apparatus, comprising:

• an illumination optical system for illuminating an original, in a predetermined shape, with light from a light source;
• a projection optical system for projecting a pattern of the original, illuminated by said illumination optical system, onto a substrate;
• a first photodetector disposed inside said illumination optical system, for detecting a quantity of illumination light in said illumination optical system and providing an output of illumination light quantity information in relation to each operative position in scan motion;
• a second photodetector for detecting a quantity of reflection light from the original and providing an output of information of reflection light quantity from the original at each operative position in the scan motion;
• calculating means for calculating an illumination light quantity solely from the light source, on the basis of the illumination light quantity information from said first photodetector and the reflection light quantity information from said second photodetector;
• correction means for receiving an output of said calculating means and receiving, at each operative position of the scan motion, illumination light quantity information from said first photodetector and reflection light quantity information from said second photodetector, to calculate information of illumination light quantity solely from the light source while excluding influence of a reflection light component on the basis of the output;
• and
• control means for receiving the information of illumination light quantity solely from the light source, with the influence of reflection light component being excluded, on the basis of an output of said correction means, and to control output of exposure light from the light source so that, at each operative position in the scan motion, the illumination light quantity solely from the light source is kept at a predetermined value.

A scan type exposure apparatus wherein a pattern of an original is lithographically transferred to a substrate sequentially while the original and the substrate are scanningly moved relative to exposure light, said apparatus comprising:

• an illumination optical system for illuminating an original with exposure light output from a light source;
• a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate;
• a photodetector, disposed in said illumination optical system, for detecting a quantity of light illuminating the original;
• control means for controlling the exposure light output from the light source on the basis of the output of the photodetector;
• and
• correcting means for reducing an influence of reflection light from the original, on the basis of the output of the photodetector as the original is illuminated by the illumination optical system, while excluding influence of a reflection light component.