Lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsMark Kroon, Jan Evert Van Der Werf, Haico Victor Kok
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Abstract
A lithographic apparatus according to one embodiment of the invention includes an image sensing device configured and arranged to measure a pattern in a patterned beam of radiation. The image sensing device comprises a slab on which at least two sensors are formed. The sensors are sensitive to radiation of the beam and are arranged on a first side of the slab. A film that is non-transparent to radiation of the beam is provided at the first side over the sensors. The film includes a patterned segment above each sensor.
Claims55
A lithographic apparatus configured and arranged to image a pattern onto a substrate that is at least partially covered by a layer of radiation-sensitive material, said apparatus comprising:
- an image sensing device configured and arranged to measure a pattern in a patterned beam of radiation, said image sensing device including:
- a slab;
- at least two radiation-sensitive sensors arranged at a first side of the slab, each sensor being formed on said slab and being sensitive to the radiation of the beam;
- and
- a film of a material that is non-transparent to the radiation of the beam, said film being provided at the first side of the slab over said sensors and including a patterned segment above each sensor configured and arranged to selectively pass radiation of the beam to said sensor.
A lithographic apparatus configured and arranged to image a pattern onto a substrate that is at least partially covered by a layer of radiation-sensitive material, said apparatus comprising:
- a substrate table configured and arranged to hold the substrate;
- an image sensing device configured and arranged to measure a pattern in a patterned beam of radiation, said image sensing device including:
- a slab;
- at least two radiation-sensitive sensors arranged at a first side of the slab, each sensor being formed on said slab and being sensitive to the radiation of the beam;
- a film of a material that is non-transparent to the radiation of the beam, said film being provided at the first side of the slab over said sensors and including a patterned segment above each sensor configured and arranged to selectively pass radiation of the beam to said sensor;
- and
- an intermediate plate disposed between the substrate table and the slab,
- wherein said slab is mounted with a surface opposite to the first side facing a first surface of the intermediate plate.
A device manufacturing method including imaging a pattern onto a substrate that is at least partially covered by a layer of radiation-sensitive material, said method comprising:
- using patterning structure to endow a beam of radiation with a pattern in its cross-section;
- measuring a pattern in the patterned beam using an image sensing device that includes a slab having at least two radiation-sensitive sensors arranged on a first side of the slab, each sensor being formed on said slab and being sensitive to the radiation of the beam,
- wherein said measuring comprises using at least one of said sensors to measure an intensity of an unpatterned area in a cross-section of said patterned beam, and using at least another one of said sensors to measure an intensity of a patterned area neighboring the unpatterned area in the cross-section of said patterned beam.
Dependencies are inferred from the claim text.