Back to results
US 6,888,115 B2Granted
Cascaded planar exposure chamber
AssigneeIndustrial Microwave Systems, L.L.C.
InventorJ. Michael Drozd
Life of this patent
Estimating the term…
Abstract
A device for heating relatively wide planar materials is formed by at least two parallel waveguides. Each waveguide has an opening that forms a single opening for a planar material. The planar material is propelled in a direction parallel to the propagation of an electronic wave. If each waveguide is kept in TE mode, heating is uniform across the planar material. Power splitters, septums, tuning stubs, and impedance matching can be used to control the heating in each waveguide.
Claims20
A device for heating a material, the device comprising:
- a rectangular chamber having a firer end and a second end;
- a source capable of generating an electromagnetic wave that propagates from the first end to the second end;
- an opening at the first end of the rectangular chamber;
- a path for a material, the path passing through the opening, the path extending from the first end of the rectangular chamber to the second end of the rectangular chamber;
- and
- the width of said path exceeding twice of the cutoff frequency distance of the rectangular chamber, while the length of said path is greater than the cutoff frequency distance of the rectangular waveguide.
3 more elements
A device for heating a material, the device comprising:
- at least two parallel chambers, each chamber having a first end and a second end;
- a first opening at the first end of the first chamber;
- a second opening at the first end of the second chamber;
- said first opening and said second opening forming a path for a planar material;
- and
- said path extending from said first end of each chamber to the second end of each chamber.
3 more elements
Dependencies are inferred from the claim text.