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US 6,887,910 B2Granted
Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom
AssigneeDow Global Technologies LLC
InventorsKenneth J. Bruza, James P. Godschalx, Edward O. Shaffer, II, Dennis W. Smith, Jr., Paul H. Townsend, III, Kevin J. Bouck, Qing Shan J. Niu
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Abstract
A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.
Claims19
A method of making a porous film on a substrate comprising:
- providing a substrate;
- coating on the substrate a composition a) a hydrocarbon-containing matrix precursor;
- b) a poragen;
- and c) a solvent wherein the matrix precursor is selected to form upon curing a cross-linked, hydrocarbon-containing material having a Tg of greater than 300° C.;
- removing the solvent, curing the matrix precursor to form the cross-linked hydrocarbon containing material and degrading the poragen by heating to a temperature less than the thermal stability temperature of the cross-linked hydrocarbon containing material, wherein the matrix precursor is a material having reactive groups for cross-linking selected from diene and dienophile groups, benzocyclobutene groups, and perfluoroethylene groups.
2 more elements
Dependencies are inferred from the claim text.