Embossed mask lithography

A method for producing digital circuitry by an emboss and lift off process, said process comprising the steps of:

• coating a surface of a flexible substrate with at least one film;
• coating said film on said flexible substrate with a photo curable polymer, so as to form a first layered grouping having a top side and a bottom side, said bottom side being substantially in contact with said flexible substrate;
• embossing a plurality of substantially parallel depressions having trench portions and peak portions on said polymer by use of a substantially transparent embossing tool;
• curing said photo curable polymer with light energy directed through said substantially transparent embossing tool;
• patterning said first layered grouping by etching of an area comprising said plurality of depressions through to said surface of said substrate substantially contiguous with the trench portions of said depressions within said first layered grouping
• applying a transfer polymer layer to said top side of said first layered grouping;
• inverting said first layered grouping;
• lifting off said flexible substrate so as to expose a substantially planar surface on said bottom side of said first layered grouping;
• providing a second layered grouping substantially in accordance with said coating, forming, embossing, curing and patterning steps of the first layered grouping;
• applying said second layered grouping on said exposed substantially planar surface of said bottom side of said first layered grouping in such a way that said substantially parallel linear depressions of said first and second layered groupings are in a substantially orthogonal juxtaposition to each other.