Process and manufacturing tool architecture for use in the manufacture of one or more protected metallization structures on a workpiece
AssigneeSemitool, Inc.
InventorE. Henry Stevens
Life of this patent
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AssigneeSemitool, Inc.
InventorE. Henry Stevens
Estimating the term…
A process for providing one or more protected copper elements on a surface of a workpiece is set forth. In accordance with the process, a barrier layer is applied to the workpiece. If the barrier layer is not suitable as a seed layer for subsequent electroplating processes, a separate seed layer is applied over the surface of the barrier layer. One or more copper elements are then electroplated on selected portions of the seed layer or, if suitable, the barrier layer. If used, the seed layer is then substantially removed. At least a portion of a surface of the barrier layer is rendered unplatable while leaving the copper elements suitable for electroplating. A protective layer is then electroplated onto surfaces of the one or more copper elements.
A method of fabricating interconnect metallization structures on a workpiece, comprising:
A method of fabricating metal interconnect structures on a workpiece, comprising:
Dependencies are inferred from the claim text.