Negative resist composition
AssigneeFuji Photo Film Co., Ltd.
InventorKazuya Uenishi
Life of this patent
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Abstract
A negative resist composition comprises: (A) an alkali-soluble resin; (B) a compound capable of generating an acid upon irradiation with a radiation; (C) a crosslinking agent capable of crosslinking by the action of an acid; and (D) a solvent mixture containing: at least one solvent selected from the group A below; and at least one selected from the group consisting of the group B below and the group C below: group A: a propylene glycol monoalkyl ether carboxylate; group B: a propylene glycol monoalkyl ether, an alkyl lactate, an acetic ester, a chain ketone and an alkyl alkoxypropionate; group C: a γ-butyrolactone, an ethylene carbonate and a propylene carbonate.
Claims20
A negative resist composition to be irradiated with one of an electron beam and X ray comprising:
- (A) an alkali-soluble resin;
- (B) a compound capable of generating an acid upon irradiation with a radiation;
- (C) a crosslinking agent capable of crosslinking by the action of an acid;
- and
- (D) one of solvent mixtures (DI) and (DII):
- (DI) a solvent mixture containing at least one solvent selected from the group A below and at least one solvent selected from the group B below;
- and
- (DII) a solvent mixture containing at least one solvent selected from the group A below and at least one solvent selected from the group C below:
- group A:
- a propylene glycol monoalkyl ether carboxylate;
- group B:
- a propylene glycol monoalkyl ether, an alkyl lactate, an acetic ester, a chain ketone and an alkyl alkoxypropionate;
- group C:
- a γ-butyrolactone, an ethylene carbonate and a propylene carbonate.
A negative resist composition to be irradiated with one of an electron beam and X ray comprising:
- (A) an alkali-soluble resin;
- (B) a compound generating an acid upon irradiation with a radiation;
- (C) a crosslinking agent capable of crosslinking by the action of an acid;
- and
- (D) a solvent mixture containing:
- at least one solvent selected from the group A below;
- at least one solvent selected from the group B below;
- and at least one solvent selected from the group C below:
- group A:
- a propylene glycol monoalkyl ether carboxylate;
- group B:
- a propylene glycol monoalkyl ether, an alkyl lactate, an acetic ester, a chain ketone and an alkyl alkoxypropionate;
- group C:
- a γ-butyrolactone, an ethylene carbonate and a propylene carbonate.
Dependencies are inferred from the claim text.