Hollow cathode target and methods of making same
AssigneeCabot Corporation
InventorsRobert B. Ford, Christopher A. Michaluk
Life of this patent
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Abstract
Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.
Claims19
A sputtering target assembly comprising a sputtering target having sidewalls, and further comprising a top portion made of a non-sputtering or sputter resistant material and attached to the sidewalls of the sputtering target, wherein said sidewalls and said top portion form a hollow cathode target, wherein the top portion is made of a valve metal base material having a strong (100) texture.
Dependencies are inferred from the claim text.