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US 6,886,733 B2Granted
Conductive powder applying device immersing substrate into conductive powder by rotating tank including conductive powder and substrate at opposing positions
AssigneeShinko Electric Industries Co., Ltd.
InventorMasatoshi Katayama
Life of this patent
Estimating the term…
Abstract
A conductive powder is stored at a predetermined position in a tank. At least one substrate is placed at a predetermined position opposite the conductive powder in the tank. The tank is rotated so as to immerse the substrate into the conductive powder. Thereby, the conductive powder is applied to the substrate.
Claims16
A conductive powder applying device applying a conductive powder to a substrate, the device comprising:
- a tank including said conductive powder stored at a predetermined position in the tank, and said substrate placed at a predetermined position opposite said conductive powder in the tank;
- and
- a rotating mechanism rotating said tank so as to immerse said substrate into said conductive powder.
Dependencies are inferred from the claim text.