Plasma cleaning gas with lower global warming potential than SF6
AssigneeAir Products and Chemicals, Inc.
InventorsJohn Peter Hobbs, James Joseph Hart
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Abstract
A process for cleaning a deposit from an interior surface of a processing chamber includes generating a plasma from a cleaning gas including SO2F2 and contacting the interior surface with the plasma for a time sufficient to convert the deposit into a volatile product, thereby cleaning the deposit from the interior surface, in which the process is conducted in the absence of SF6. The deposits, which may be removed by the process of the invention, include silicone, silicone oxide, silicone nitride, tungsten, copper and aluminum.
Claims13
A process for cleaning a deposit from an interior surface of a processing chamber, said process comprising:
- generating a plasma from a cleaning gas comprising SO2F2;
- and
- contacting the interior surface with the plasma for a time sufficient to convert the deposit into a volatile product, thereby cleaning the deposit from the interior surface, wherein the process is conducted in the absence of SF6.
Dependencies are inferred from the claim text.