Reactors having gas distributors and methods for depositing materials onto micro-device workpieces

A reactor for depositing material onto a micro-device workpiece, comprising:

• a reaction chamber;
• a workpiece support in the reaction chamber;
• and
• a gas distributor in the reaction chamber, the gas distributor comprising a plurality of external mixing recesses exposed to and generally facing the workpiece support, a first gas conduit having a plurality of first injectors at mixing recesses, and a second gas conduit having a plurality of second injectors at mixing recesses, wherein the first injectors projects a first gas flow into mixing recesses and the second injectors project a second gas flow into mixing recesses.

A system for depositing material onto a surface of a micro-device workpiece, comprising:

• a gas supply assembly having a first gas source, a second gas source, and a third gas source;
• a reaction chamber coupled to the gas supply assembly;
• a workpiece support in the reaction chamber;
• and
• a gas distributor in the reaction chamber, the gas distributor comprising a shower head, a first gas conduit coupled to the first gas source, a second gas conduit coupled to the second gas source, a third gas conduit coupled to the third gas source, a plurality of first injectors coupled to the first gas conduit, a plurality of second injectors coupled to the second gas conduit, and a plurality of third injectors coupled to the third gas conduit, wherein the first injectors project a first gas flow along first vectors that intersect in a mixing zone along an external surface of the gas distributor generally facing the workpiece support, and wherein the second injectors project a second gas flow along second vectors that intersect in mixing zone.

A system for depositing material onto a surface of a micro-device workpiece, comprising:

• a gas supply assembly having a first gas source and a second gas source;
• a reaction chamber coupled to the gas supply assembly;
• a workpiece support in the reaction chamber:
• and
• a gas distributor in the reaction chamber, the gas distributor comprising a first gas conduit coupled to the first gas source, a second gas conduit coupled to the second gas source, and a first surface having an external mixing recess, wherein the first gas conduit has a first injector that projects a first gas flow into mixing recess and the second gas conduit has a second injector that projects the second gas flow into the mixing recess, and wherein the first and second injectors are positioned to induce a vortex in mixing recess.

A system for depositing material onto a surface of a micro-device workpiece, comprising:

• a gas supply assembly having a first gas source and a second gas source;
• a reaction chamber coupled to the gas supply assembly;
• a workpiece support in the reaction chamber;
• and
• a gas distributor in the reaction chamber, the gas distributor comprising a first gas conduit coupled to the first gas source, a second gas conduit coupled to the second gas source, and plurality of external mixing recesses, the first gas conduit having a plurality of first injectors positioned within mixing recesses, the second conduit having a plurality of second injectors positioned within mixing recesses, wherein the first injectors project a first gas flow into mixing zones and the second injectors project a second gas flow into mixing zones, and wherein mixing zones are positioned at least partially within corresponding mixing recesses.

A system for depositing material onto a surface of a micro-device workpiece, comprising:

• a gas supply assembly having a first gas source and a second gas source;
• a reaction chamber coupled to the gas supply assembly;
• a workpiece support in the reaction chamber;
• and
• a gas distributor in the reaction chamber, the gas distributor comprising a first gas conduit coupled to the first gas source, a second gas conduit coupled to the second gas source, and a plurality of external mixing recesses facing the workpiece support, wherein the first gas conduit has a plurality of first outlets and the second gas conduit has a plurality of second outlets, wherein the individual mixing recesses have at least one first outlet and at least one second outlet to flow gases from the first and second gas conduits into mixing recess.

A system for depositing material onto a surface of a micro-device workpiece, comprising:

• a gas supply assembly having a first gas source, a second gas source, and a third gas source;
• a reaction chamber coupled to the gas supply assembly;
• a workpiece support in the reaction chamber;
• and
• a gas distributor in the reaction chamber, the gas distributor comprising a shower head, a first inlet configured for attachment to the first gas source, a second inlet configured for attachment to the second gas source, a third inlet configured for attachment to the third gas source, at least one first outlet in fluid communication with the first inlet, at least one second outlet in fluid communication with the second inlet, at least one third outlet in fluid communication with the third inlet, and an external flow mixer that mixes a first flow from the first outlet and a second flow from the second outlet along a bottom side of the gas distributor facing the workpiece support.