Independently controlled read and write head stripe height parameters in slider back end process
AssigneeHeadway Technologies, Inc.
InventorsMoris Dovek, Wenjie Chen
Life of this patent
Estimating the term…
Loading patent…
AssigneeHeadway Technologies, Inc.
InventorsMoris Dovek, Wenjie Chen
Estimating the term…
A lapping guide system and method for lapping a merged read/write head are disclosed. The resistance RRE of a first ELG near the sensor in the read head is correlated to the resistance RWE of a second ELG and to the width of a first optical lapping guide (OLG) near the neck region of the write head. As the lapping progresses, RWE and RRE increase and the OLG width along the lapping plane increases. Thus, an OLG width and a RWE corresponding to a target neck height or throat height and a RRE corresponding to a target stripe height are determined. A lapping plane is actively tilted to enable write head dimensions to be independently controlled on a per wafer or per row basis. The first OLG is a triangular feature with one side parallel to the lapping plane and the other two sides converging near the lapping plane.
A lapping guide system for use in a lapping process of a magnetic read/write head formed on a substrate, said lapping process forms an ABS plane, comprising:
A method of lapping a row of magnetic read/write heads formed on a substrate, said lapping forms an ABS plane, comprising:
A method of lapping a row of magnetic read/write heads formed on a substrate, said lapping forms an ABS plane, comprising:
Dependencies are inferred from the claim text.