Method for manufacturing spacer for electron source apparatus, spacer, and electron source apparatus using spacer
AssigneeCanon Kabushiki Kaisha
InventorsYoichi Ando, Masahiro Fushimi
Life of this patent
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Abstract
A method for manufacturing a spacer for use in an electron source apparatus comprising an electron source having an electron emission device, an opposing member opposed to the electron source and a spacer provided between the electron ray source and the opposing member, the method comprising a coating step for providing a film on a spacer substrate constituting the spacer, the coating step including a step for bringing a preformed film type material into contact with the spacer substrate.
Claims19
A method for manufacturing a spacer for use in an electron source apparatus comprising an electron source having an electron emission device, an opposing member opposed to the electron source and a spacer provided between the electron source and the opposing member, said method comprising:
- a coating step for providing a film to a spacer substrate constituting the spacer, said coating step including a step for bringing a preformed film type material into contact with the spacer substrate.
A method for manufacturing a spacer for use in an electron source apparatus comprising an electron source having an electron ray emission device, an opposing member opposed to the electron source and the spacer provided between the electron source and the opposing member, said method comprising:
- a coating step for providing a film on a spacer substrate constituting the spacer, said coating step including a supplying step for supplying a material of the film to a wide region that includes, and is broader than, a film covering region of the spacer substrate;
- and
- a position selective film forming step for forming the film only at the film covering region, with only part of the material supplied on the spacer substrate.
A method for manufacturing a spacer for use in an electron source apparatus comprising an electron source apparatus comprising an electron source having an electron ray emission device, an opposing member opposed to the electron source and the spacer provided between the electron source and the opposing member, said method comprising:
- a coating step for providing a film on a spacer substrate constituting the spacer, said coating step including a supplying step for supplying a material of the film to a wide region that includes, and is broader than, a film covering region of the spacer substrate;
- and
- a film forming step for forming the film only at the film covering region, with only part of an area of the material supplied on the spacer substrate.
Dependencies are inferred from the claim text.