Thermal process station with heated lid
AssigneeFSI International, Inc.
InventorsVuong P. Nguyen, Richard E. Sims, Xiaoguang Zhu
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AssigneeFSI International, Inc.
InventorsVuong P. Nguyen, Richard E. Sims, Xiaoguang Zhu
Estimating the term…
Methods and apparatuses to improve the temperature uniformity of a workpiece being processed on a heated platen of a thermal processing station. A heated platen is enclosed in a housing incorporating an additional heat source that uniformly outputs thermal energy into the process chamber in which the heated platen is positioned. In preferred embodiments, this heat source is positioned in the lid of the housing. It is additionally preferred that the heated lid includes features that provide a gas flow path to introduce to and/or purge gas from the process chamber. In terms of photoresist performance, the improved thermal uniformity provided by using such an additional heat source in the housing, e.g., in the lid, offers improved line width control and line uniformity across a wafer.
A thermal process station for thermally processing a workpiece, the station comprising:
A thermal process station for thermally processing a workpiece, the station comprising:
A thermal process station for thermally processing a workpiece, the station comprising:
A method of improving the thermal uniformity of a workpiece during a thermal treatment, comprising the steps of:
A thermal process station for thermally processing a workpiece, the station comprising:
Dependencies are inferred from the claim text.