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US 6,882,407 B2Granted
Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorTadahiro Asaishi
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AssigneeCanon Kabushiki Kaisha
InventorTadahiro Asaishi
Estimating the term…
An exposure apparatus which has a light source and transfers a pattern of an original to a substrate using light supplied from the light source includes a photoelectric sensor used to control an amount of light to which the substrate is exposed, a memory storing a first value for correcting an output value of the photoelectric sensor with respect to each accumulated energy of light, having a first power, with which the photoelectric sensor is irradiated, a calculator which calculates a second value for correcting an output value of the photoelectric sensor corresponding to a second accumulated energy of light, having a second power, with which the photoelectric sensor is irradiated, based on the first value in the memory corresponding to the second accumulated energy, and a ratio of the second power to the first power, and a correction unit which corrects an output value of said photoelectric sensor using the second value.
An exposure apparatus which has a light source and transfers a pattern of an original to a substrate using light supplied from said light source, said apparatus comprising:
An exposure method of transferring a pattern of an original to a substrate using light supplied from a light source, said method comprising steps of:
Dependencies are inferred from the claim text.