Integrated circuit structures with a conductor formed in a through hole in a semiconductor substrate and protruding from a surface of the substrate
AssigneeTru-Si Technologies, Inc.
InventorOleg Siniaguine
Life of this patent
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AssigneeTru-Si Technologies, Inc.
InventorOleg Siniaguine
Estimating the term…
To fabricate contacts on a wafer backside, openings (124) are formed in the face side of the wafer (104). A dielectric layer (140) and some contact material (150), e.g. metal, are deposited into the openings. Then the backside is etched until the contacts (150C) are exposed and protrude out. The protruding portion of each contact has an outer sidewall (150V). At least a portion of the sidewall is vertical or sloped outwards with respect to the opening when the contact is traced down. The contact is soldered to an another structure (410), e.g. a die or a PCB. The solder (420) reaches and at least partially covers the sidewall portion which is vertical or sloped outwards. The strength of the solder bond is improved as a result. The dielectric layer protrudes around each contact. The protruding portion (140P) of the dielectric becomes gradually thinner around each contact in the downward direction. The thinned dielectric is more flexible, and is less likely detach from the contact when the contact is pulled sideways. Other embodiments are also described.
A body comprising a semiconductor substrate which has a top surface and a bottom surface, wherein one or more through holes pass through the substrate between the top and bottom surfaces, the body comprising one or more circuit elements formed in and/or over the top surface of the semiconductor substrate;
An integrated circuit structure comprising:
Dependencies are inferred from the claim text.