Apparatus and method for supplying chemicals
AssigneeFujitsu Limited
InventorNaoki Hiraoka
Life of this patent
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Abstract
A chemical supplying apparatus including first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a processing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
Claims4
A method for preparing a mixture in a first mixing tank and a second mixing tank and supplying the mixture to a semiconductor production-processing unit, the method comprising the steps of:
- mixing a plurality of stock chemicals to prepare the mixture in the first mixing tank;
- supplying the mixture to the semiconductor production-processing unit;
- starting preparation of a new batch of the mixture in the second mixing tank when the liquid level of the mixture in the first mixing tank drops to a first predetermined value as detected by a level sensor;
- and
- supplying the mixture prepared in the second mixing tank to the semiconductor production-processing unit when the liquid level of the mixture in the first mixing tank drops to a second predetermined value.
Dependencies are inferred from the claim text.