Substrate dual-side processing apparatus

A substrate dual-side processing apparatus comprising:

• a processor to apply a specific process to a front surface and a rear surface of a substrate;
• a reversing unit to reverse the substrate;
• and
• a substrate-transfer mechanism to transfer the substrate between the processor and the reversing unit.
• wherein the reversing unit has a pair of holders for holding the substrate at the front and rear surfaces, a drive mechanism for driving the pair of holders so that the holders become close to or apart from each other, and a rotating mechanism for rotating the substrate, thus the substrate being reversed while held by the holders.
• wherein each of the pair of holders has at least three supporters for supporting substrate edges when the substrate is held by the holders, and
• wherein each of the three supporters has a wafer-slide blocking wall to engage with the substrate edges, a sloping step sloping down from a lower edge of the wafer-slide blocking wall to an inner side of each supporter and a sloping guide face ascending from an upper edge of the wafer-slide blocking wall to outside.