Apparatus and method for large area chemical vapor deposition using multiple expanding thermal plasma generators

A method of producing a plasma enhanced chemical vapor deposition coating on a substrate, the method comprising the steps of:

• a) providing the substrate to the deposition chamber;
• b) providing at least one set of expanding thermal plasma means, wherein the at least one set of expanding thermal plasma means comprises at least two expanding thermal plasma generating means that are codirectionally oriented and located outside and in fluid communication with a deposition chamber and wherein each of the plasma means are perpendicular to a translation direction of the substrate;
• c) maintaining the at least one set of expanding thermal plasma means at a pressure that is greater than a pressure in the deposition chamber;
• d) generating a plurality of plasmas within the at least one set of expanding thermal plasma means;
• e) expanding the plurality of plasmas into the deposition chamber to form a plurality of expanding thermal plasma plumes directed toward the substrate, wherein each of the plurality of expanding thermal plasma plumes has a central axis, wherein the central axes of the plurality of expanding thermal plasma plumes are oriented parallel to each other;
• and
• f) providing at least one reagent to the plurality of expanding thermal plasma plumes, wherein the at least one reagent interacts with the plurality of expanding thermal plasma plumes to form the plasma enhanced chemical vapor deposition coating on a substrate;
• and
• g) heating at least one portion of the substrate by a heating means other than the plurality of expanding thermal plasma plumes, said heating means being located and adapted to heat regions spaced from the central axes of said plasma plumes.