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US 6,867,859 B1Granted
Inductively coupled plasma spectrometer for process diagnostics and control
AssigneeLightwind Corporation
InventorGary Powell
Life of this patent
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Abstract
The present invention relates to an apparatus and method for forming a plasma in the exhaust line of a primary process reactor. The plasma is generated in an inductive source (5) to examine the chemical concentrations of the waste or exhaust gas in vacuum lines that are below atmospheric pressure. The optical radiation emitted by the plasma is analyzed by an optical spectrometer (9) and the resulting information is used to diagnose, monitor, or control operating states in the main vacuum vessel.
Claims24
A plasma analysis device for analyzing a gaseous sample within a plasma chamber, including:
- a plasma chamber;
- an exhaust gas feed gaseously coupled to the plasma chamber;
- a radio frequency power oscillator, disposed outside the plasma chamber, electromagnetically coupled to a space within the chamber;
- an optical window into the plasma chamber;
- a spectral analyzer comprising a grating and a detector array, optically coupled to the optical window.
2 more elements
Dependencies are inferred from the claim text.