Method of using time interval in IC foundry to control feed back system
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShui-Tien Lin, Yi-Chuan Lo, Jimmy Hu, Chen-Yu Chang
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Abstract
An advanced process control method using time interval between lots of a particular product to control the weighting of feedback data is described. A plurality of products are fabricated wherein the products are tracked by the process control method based on product type, for example. Variation in a parameter is detected. The adjustment speed of a process recipe is determined based on a time interval weighting wherein the time interval is defined as the time between processing of lots of the same product type. The process recipe is updated at the determined adjustment speed to decrease variation of the parameter.
Claims25
A method of process control comprising:
- fabricating a plurality of products wherein said products are tracked by said process control method based on type;
- detecting variation in a parameter;
- determining adjustment speed of a process recipe based on a time interval weighting wherein said time interval is defined as the time between processing of lots of the same said type;
- and
- updating a process recipe at said adjustment speed to decrease said variation of said parameter.
A method of process control comprising:
- fabricating a plurality of products wherein said products are tracked by said process control method based on product type;
- detecting variation in a parameter;
- determining adjustment speed of a process recipe based on a time interval weighting wherein said time interval is defined as the time between processing of lots of the same said product type;
- and
- updating a process recipe at said adjustment speed to decrease said variation of said parameter.
A method of process control comprising:
- providing a plurality of tools and a plurality of products to be run on said tools;
- identifying tool effects on a parameter for each tool and product effects on said parameter for each product;
- calculating a desired recipe for each product on each tool based on said tool effects and said product effects;
- thereafter running said plurality of products on said plurality of tools wherein said products are tracked by said process control method based on product type;
- thereafter detecting variation in a parameter;
- determining adjustment speed of said desired recipe based on a time interval weighting wherein said time interval is defined as the time between processing of lots of the same said product type;
- and
- updating said desired recipe to decrease said variation of said parameter at said adjustment speed.
A method of process control of a photolithography process comprising:
- fabricating a plurality of products wherein said products are tracked by said process control method based on product type;
- detecting variation in critical dimension;
- determining adjustment speed of an exposure dose recipe based on a time interval weighting wherein said time interval is defined as the time between processing of lots of the same said product type;
- and
- updating said exposure dose recipe at said adjustment speed to decrease said variation of said critical dimension.
Dependencies are inferred from the claim text.