US 6,861,205 B2 · Three dimensional microstructures and method of making

Abstract

A method of forming complex three-dimensional microstructures wherein an external stimulus is applied to a first layer of a photosensitive material, thereby creating voids in the first layer, and any material present in those voids is removed. A sacrificial material is then provided within at least a portion of the voids. This sacrificial layer fills the voids, either in whole or in part, and enables a second layer of photosensitive material to be stacked upon the first, while still preserving the pattern formed in the first layer. Once the sacrificial layer has been applied, a second layer of photosensitive material may then be stacked onto the first. Successive layers of photosensitive material and sacrificial material may be added until a final, complex three-dimensional structure is created. The sacrificial material may then be removed with a solvent such as carbon dioxide.

Claims25

Dependent claims

A method for fabricating three dimensional structures comprising the steps of

a. providing a first layer of a photosensitive material of epoxy resin of bisphenol A glycidyl ether polymer) (CAS 28906-96-9) and a photoacid generator of mixed triarylsulfonium/hexafluoroantimonate salt (CAS 89452-37-9/CAS 71449-78-0),
b. applying an external stimulus of UV light to said first layer, thereby creating voids in said first layer,
c. removing any material present in said voids,
d. providing a layer of a sacrificial material of a fluropolymer within at least a portion of said voids,
e. providing a second layer of photosensitive material of epoxy resin of bisphenol A glycidyl ether polymer) (CAS 28906-96-9) and a photoacid generator of mixed triarylsulfonium/hexafluoroantimonate salt (CAS 89452-37-9/CAS 71449-78-0) on top of said layer of a sacrificial material and in contact with at least a portion of said first layer;
f. applying an external stimulus of UV light to said second layer, thereby bonding said first to said second layer, and
g. removing said sacrificial layer by dissolving said sacrificial layer in carbon dioxide.

4 more elements

A method for fabricating three dimensional structures comprising the steps of

a. providing a first layer of a photosensitive material,
b. applying an external stimulus in said first layer, thereby creating voids in said first layer,
c. removing any material present in said voids,
providing a layer of a sacrificial material within at least a portion of said voids,
e. providing a second layer of photosensitive material on top of said layer of a sacrificial material and in contact with at least a portion of said first layer, and
f. applying an external stimulus in said second layer, thereby bonding said second layer to said first layer.

3 more elements

Dependencies are inferred from the claim text.

Three dimensional microstructures and method of making

Life of this patent

Three dimensional microstructures and method of making

Life of this patent

Abstract

Claims25