Nanotube semiconductor devices and methods for making the same
AssigneeMicron Technology, Inc.
InventorsWarren M. Farnworth, Kevin G. Duesman
Life of this patent
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Abstract
Provided herein are vertical nanotube semiconductor devices and methods for making the same. An embodiment of the semiconductor devices comprises a vertical transistor/capacitor cell including a nanotube. The device includes a vertical transistor and a capacitor cell both using a single nanotube to form the individual devices.
Claims24
A DRAM cell comprising:
- a vertical transistor including a gate, source, drain, and channel wherein a nanotube forms the channel;
- and
- a capacitor having a ground plate, an insulator, and a charge plate wherein the nanotube forms the charge plate.
A vertical transistor in a memory cell device, the vertical transistor comprising:
- a substrate;
- at least one nanotube connected substantially orthogonal to the substrate;
- a source and drain formed on the substrate;
- a conductive ring formed about an insulated exterior section of the nanotube, the conductive ring forming the gate of the vertical transistor;
- and
- wherein the nanotube forms a channel of the vertical transistor.
A memory cell capacitor comprising:
- a substrate having a first surface defining a plane;
- at least one nanotube connected substantially vertically to the substrate in relation to the plane;
- a ground cell plate formed on an exterior wall of the nanotube;
- and
- wherein the nanotube forms a cell of the capacitor.
A semiconductor device comprising:
- a substrate having a first surface;
- an insulator formed on the first surface of the substrate;
- a nanotube connected substantially perpendicular to the substrate;
- alternating layers of insulative material, and conductive material formed about an exterior wall of the nanotube, wherein the conductive layers form gates for multiple transistors;
- and
- wherein the nanotube forms an interconnection between the gates of the multiple transistors.
A semiconductor device having an electrical interconnect comprising:
- a substrate having a first surface defining a plane;
- a first trace formed on a portion of the substrate;
- a nanotube having a first end connected to the first trace, the nanotube being substantially vertical in relation to the plane defined by the first surface of the substrate;
- a second trace connected to a second end of the nanotube;
- and
- wherein the nanotube forms an electrical connection between the first trace and the second trace.
A semiconductor device comprising:
- a substrate;
- a first insulation layer formed on the substrate;
- at least one nanotube connected substantially orthogonal to the first insulation layer;
- a first conductive ring encircling a first end of the nanotube, the first conductive ring providing electrical connection from the nanotube to the substrate;
- a second insulation layer formed on the first conductive ring;
- a second conductive ring formed about an insulated exterior section of the nanotube, the second conductive ring electrically connected to the substrate;
- a third insulation layer formed on the second conductive ring;
- a third conductive ring encircling a second end of the nanotube, the third conductive ring providing electrical connection of the second end of the nanotube to the substrate;
- and
- a fourth insulation layer formed over the third conductive ring.
A semiconductor device comprising:
- a substrate;
- a first insulation layer formed on the substrate;
- at least one nanotube connected substantially orthogonal to the first insulation layer;
- a first conductive ring encircling and physically contacting an exterior wall of a first end of the nanotube, the first conductive ring providing electrical connection from the nanotube to the substrate;
- a second insulation layer formed on the first conductive ring;
- a second conductive ring encircling a first insulated exterior section of the nanotube, the second conductive ring electrically connected at a first end to the substrate;
- a third insulation layer formed on the second conductive ring;
- a third conductive ring encircling and physically contacting a second insulated exterior section of the nanotube, the third conductive ring electrically connected at a first end to the substrate;
- a fourth insulation layer formed on the third conductive ring;
- a fourth conductive ring encircling and physically contacting an exterior wall of a second end of the nanotube, the fourth conductive ring providing electrical connection of the second end of the nanotube to the substrate;
- and
- a fifth insulation layer formed on the fourth conductive ring.
A semiconductor device comprising:
- a substrate;
- a first insulation layer formed on the substrate;
- at least one nanotube connected substantially orthogonal to the first insulation layer;
- a first conductive ring encircling and physically contacting an exterior wall of a first end of the nanotube, the first conductive ring providing electrical connection from the nanotube to the substrate;
- a second insulation layer formed on the first conductive ring;
- a second conductive ring encircling and physically contacting an insulated exterior section of the nanotube, the second conductive ring electrically connected at a first end to the substrate;
- a third insulation layer formed on the second conductive layer;
- and
- a conductive layer on the third insulation layer, the conductive layer forming a capacitor ground cell plate, the ground cell plate electrically connected to the substrate.
A memory cell comprising:
- a vertical transistor including a gate, source, drain, and channel wherein a nanotube forms the channel;
- and
- a capacitor.
A semiconductor memory device comprising:
- a substrate having electrical circuitry formed thereon;
- a plurality of nanotubes connected substantially orthogonal to the substrate;
- a conductive ring about the exterior of the nanotubes, the conductive ring providing electrical connection from the nanotubes to the electrical circuitry on the substrate;
- and
- wherein the nanotubes form a cell of a capacitor and a channel of a transistor.
Dependencies are inferred from the claim text.