Method and apparatus for magnetic focusing of off-axis electron beam
AssigneeCommunications & Power Industries, Inc.
InventorsMark J. Cattelino, Fred I. Friedlander
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AssigneeCommunications & Power Industries, Inc.
InventorsMark J. Cattelino, Fred I. Friedlander
Estimating the term…
Axially symmetric magnetic fields are provided about the longitudinal axis of each beam of a multi-beam electron beam device. The magnetic field symmetry is independent of beam voltage, beam current and applied magnetic field strength. A flux equalizer assembly is disposed between the cathodes and the anodes and near the cathodes of a multi-beam electron beam device. The assembly includes a ferromagnetic flux plate completely contained within the magnetic focusing circuit of the device. The flux plate includes apertures for each beam of the multi-beam device. A flux equalization gap or gaps are disposed in the flux plate to provide a perturbation in the magnetic field in the flux plate which counters the asymmetry induced by the off-axis position of the beam. The gaps may be implemented in a number of ways all of which have the effect of producing a locally continuously varying reluctance that locally counters the magnetic field asymmetry. The flux equalizer assembly prevents or substantially reduces beam twist and maintains all of the electron beams of the device as linear beams.
An electron beam device having a longitudinal axis, comprising:
An electron beam device having a longitudinal axis, comprising:
An electron beam device having a longitudinal axis and a magnetic circuit providing a magnetic focusing field disposed about the longitudinal axis focusing the electron beam(s) to a first diameter, the device having at least one electron beam disposed parallel to and a distance from said longitudinal axis, the device comprising:
An electron beam device having a longitudinal axis and a magnetic circuit providing a magnetic focusing field disposed about the longitudinal axis focusing the electron beam(s) to a first diameter, the device having at least one electron beam disposed parallel to and a distance from said longitudinal axis, the device comprising:
Dependencies are inferred from the claim text.