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US 6,856,020 B2Granted
Semiconductor device and method for fabricating the same
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsNobuhiro Jiwari, Shinichi Imai
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Abstract
A plurality of metal interconnections are formed on a semiconductor substrate. The semiconductor substrate is held on a sample stage in a reactor chamber of a plasma processing apparatus and a material gas containing C5F8, C3F6, or C4F6 as a main component is introduced into the reactor chamber, so that a first fluorine-containing organic film having cavities at positions between the metal interconnections is deposited between the metal interconnections and on the top surfaces of the metal interconnections.
Claims2
A semiconductor device comprising:
- a plurality of metal interconnections formed on a semiconductor substrate;
- a first fluorine-containing organic film deposited between the plurality of metal interconnections and on top surfaces of the metal interconnections;
- and
- a second fluorine-containing organic film deposited on the first fluorine-containing organic film
- wherein the first fluorine-containing organic film has cavities between the plurality of metal interconnections, and
- the second fluorine-containing organic film has no cavity and is made of a film having a larger mechanical strength than the first fluorine-containing organic film.
3 more elements
A semiconductor device comprising:
- a plurality of metal interconnections formed on a semiconductor substrate;
- a first fluorine-containing organic film deposited between the plurality of metal interconnections and on top surfaces of the metal interconnections;
- and
- a second fluorine-containing organic film deposited on the first fluorine-containing organic film,
- wherein the first fluorine-containing organic film has cavities between the plurality of metal interconnections, and
- the second fluorine-containing organic film has no cavity, and contains less fluorine than the first fluorine-containing organic film.
3 more elements
Dependencies are inferred from the claim text.