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US 6,855,908 B2Granted
Glass substrate and leveling thereof
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasaki Takeuchi, Yukio Shibano
Life of this patent
Estimating the term…
Abstract
A glass substrate having a surface which has been leveled, preferably to a flatness of 0.04-1.3 nm/cm2 of the surface, by local plasma etching is provided. A glass substrate whose surface carries microscopic peaks and valleys is leveled by measuring the height of peaks and valleys on the substrate surface, and plasma etching the substrate surface while controlling the amount of plasma etching in accordance with the height of peaks.
Claims11
A method for leveling a surface of a glass substrate, the surface carrying microscopic peaks and valleys, the method comprising the steps of:
- measuring the heights of peaks and valleys on the substrate surface, and
- plasma etching the substrate surface while controlling the amount of plasma etching in accordance with the heights of peaks.
Dependencies are inferred from the claim text.