Silicon carbide having low dielectric constant
AssigneeNovellus Systems, Inc.
InventorsXingyuan Tang, Haiying Fu
Life of this patent
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Abstract
A low-k precursor reactant compound containing silicon and carbon atoms is flowed into a CVD reaction chamber. High-frequency radio-frequency power is applied to form a plasma. Preferably, the reaction chamber is part of a dual-frequency PECVD apparatus, and low-frequency radio-frequency power is applied to the reaction chamber. Reactive components formed in the plasma react to form low-dielectric-constant silicon carbide (SiC) on a substrate surface. A low-k precursor is characterized by one of: a silicon atom and a carbon—carbon triple bond; a silicon atom and a carbon—carbon double bond; a silicon—silicon bond; or a silicon atom and a tertiary carbon group.
Claims13
A method of forming oxygen-free silicon carbide having a carbon—carbon triple bond, comprising:
- flowing Ethynyltrimethylsilane (“ETMS”) into a reaction chamber;
- flowing an inert gas into the reaction chamber, wherein said flowing ETMS and an inert gas into the reaction chamber comprises flowing said ETMS and said inert gas at an inert-gas/ETMS-gas flow rate ratio in a range of about from to 2/1 to 6/1;
- not flowing into the reaction chamber a substantial amount of an oxidizer, an oxygen-containing doping gas, or any other agent containing an oxygen atom;
- forming a plasma in the reaction chamber at a temperature in a range of about from 375° C. to 425° C., at a pressure in a range of about 3 Torr to 5 Torr, by applying HF RF power at a frequency in a range of about from 1 MHz to 30 MHz and at a power level in a range of about from 0.1 W/cm2 to 0.5 W/cm2, and by applying LF RF power to said reaction chamber at a frequency in a range of about from 100 kHz to 500 kHz and at a power level in a range of about from 0.1 W/cm2 to 0.3 W/cm2.
A method of forming oxygen-containing silicon carbide having a carbon—carbon triple bond, comprising:
- flowing Ethynyltrimethylsilane (“ETMS”) into a reaction chamber;
- flowing carbon dioxide (CO2) gas into the reaction chamber, wherein said flowing ETMS and CO2 gas into the reaction chamber comprises flowing said ETMS and said CO2 gas at a CO2-gas/ETMS-gas flow rate ratio in a range of about from to 3/1 to 9/1;
- not flowing into the reaction chamber a substantial amount of an oxidizer or any other agent containing an oxygen atom except said CO2 gas;
- forming a plasma in the reaction chamber at a temperature in a range of about from 375° C. to 425° C., at a pressure in a range of about 2 Torr to 4 Torr, by applying HF RF power at a frequency in a range of about from 1 MHz to 30 MHz and at a power level of about 0.3 W/cm2, and by applying LF RF power to said reaction chamber at a frequency in a range of about from 100 kHz to 500 kHz and at a power level in a range of about from 0.15 W/cm2 to 0.3 W/cm2.
Dependencies are inferred from the claim text.