Semiconductor nano-rod devices
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHao-Yu Chen, Yee-Chia Yeo, Fu-Liang Yang, Chenming Hu
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Abstract
In a method of manufacturing a semiconductor device, a semiconductor layer is patterned to form a source region, a channel region, and a drain region in the semiconductor layer. The channel region extends between the source region and the drain region. Corners of the channel region are rounded by annealing the channel region to form a nano-rod structure. Part of the nano-rod structure is then used as a gate channel. Preferably, a gate dielectric and a gate electrode both wrap around the nano-rod structure, with the gate dielectric being between the nano-rod structure and the gate electrode, to form a transistor device.
Claims12
A method of manufacturing a semiconductor device, comprising:
- providing a semiconductor structure comprising a semiconductor layer overlying an insulating material;
- patterning the semiconductor layer to form a source region, a channel region, and a drain region in the semiconductor layer, wherein the channel region extends between the source region and the drain region;
- and
- rounding corners of the channel region by annealing.
A method of manufacturing a semiconductor nano-rod device, comprising:
- patterning a semiconductor layer to form a source region, a channel region, and a drain region in the semiconductor layer, wherein the channel region extends between the source region and the drain region;
- rounding corners of the channel region by annealing the channel region;
- etching the insulating layer using an etch chemistry selective against etching the semiconductor layer, wherein the etching is performed long enough so that at least a segment of the rounded channel region is suspended above a proximate portion of the insulating layer;
- forming a gate dielectric material on a surface of and about the rounded channel region;
- forming a gate electrode material on the gate dielectric and about the rounded channel region;
- and
- patterning the gate electrode material to form a gate electrode, the gate electrode comprising a gate wrap region that wraps around the rounded channel region and a gate contact region extending therefrom.
Dependencies are inferred from the claim text.