Method for cleaning a ceramic member for use in a system for producing semiconductors, a cleaning agent and a combination of cleaning agents
AssigneeNGK Insulators, Ltd.
InventorsShinji Yamaguchi, Taiji Kiku, Nobuyuki Kondou
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Abstract
The present invention provides a method for cleaning a ceramic member for use in a system for producing semiconductors. The method has the step of cleaning the ceramic member with an organic acid or a weak acid. Preferably, the ceramic member is cleaned with a strong acid before the cleaning with an organic acid or a weak acid. The ceramic member may be subjected to a blasting treatment before the cleaning with an organic acid or a weak acid. According to the method, the amount of metal transferred from the ceramic member to a semiconductor may be considerably reduced.
Claims8
A method for cleaning a ceramic member for use in a system for producing semiconductors, the method comprising the step of cleaning said ceramic member with oxalic acid, wherein said ceramic member has a semiconductor mounting surface having an embossed portion surrounding at least a part of said semiconductor mounting surface.
A method for cleaning a ceramic member for use in a system for producing semiconductors, the method comprising the steps of:
- subjecting said ceramic member to a blasting treatment;
- and
- cleaning said ceramic member with oxalic acid after said blasting treatment, wherein said ceramic member has a semiconductor mounting surface having an embossed portion surrounding at least a part of said semiconductor mounting surface.
Dependencies are inferred from the claim text.