Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus
AssigneeKabushiki Kaisha Toshiba
InventorsMichio Sato, Takashi Nakamura, Yoichiro Yabe
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AssigneeKabushiki Kaisha Toshiba
InventorsMichio Sato, Takashi Nakamura, Yoichiro Yabe
Estimating the term…
A component for a vacuum deposition apparatus comprises a component body and a spray deposit formed on a surface of a component body. A spray deposit has surface roughness in which a mean spacing S of tops of local peak of profile is in the range from 50 to 150 μm, and distances to a bottom of profile valley line Rv and to a top of profile peak line are in the ranges from 20 to 70 μm, respectively. Furthermore, a spray deposit has a low hardness coat selected from an Al base spray deposit of Hv 30 (Vickers hardness) or less, a Cu base spray deposit of Hv 100 or less, a Ni base spray deposit of Hv 200 or less, a Ti base spray deposit of Hv 300 or less, a Mo base spray deposit of Hv 300 or less and a W base spray deposit of Hv 500 or less. Such component for a vacuum deposition apparatus may suppress, with stability and effectiveness, peeling of deposition material adhering on a component during deposition. In addition, the number of apparatus cleaning and of exchange of components may be largely reduced. A target comprises a similar spray deposit. A vacuum deposition apparatus is one in which above component for a vacuum deposition apparatus is applied in a holder of a sample to be deposited, a deposition material source holder, a preventive component and so on.
A component of a vacuum deposition apparatus, comprising:
A target apparatus, comprising:
A target apparatus, comprising:
Dependencies are inferred from the claim text.