Anode impedance control through electrolyte flow control
AssigneeApplied Materials, Inc.
InventorsHarald Herchen, Craig Brodeur, Quinwei Wu, Peter Kimball, Vincent Burkhart
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AssigneeApplied Materials, Inc.
InventorsHarald Herchen, Craig Brodeur, Quinwei Wu, Peter Kimball, Vincent Burkhart
Estimating the term…
Embodiments of the invention generally provide an electrochemical plating cell having an electrolyte container assembly configured to hold a plating solution therein, a head assembly positioned above the electrolyte container, the head assembly being configured to support a substrate during an electrochemical plating process, and an anode assembly positioned in a lower portion of the electrolyte container. The anode assembly generally includes a copper member having a substantially planar upper surface, at least one groove formed into the substantially planar upper surface, each of the at least one grooves originating in a central portion of the substantially planar anode surface and terminating at a position proximate a perimeter of the substantially planar upper surface, and at least one fluid outlet positioned at a perimeter of the substantially planar upper anode surface.
An electrochemical plating cell, comprising:
An anode for an electrochemical plating cell, comprising a disk shaped soluble anode having an upper anode surface formed thereon, the upper anode surface having at least one channel and at least one fluid outlet formed therein, each of the at least one channels originating at a central portion of the upper anode surface and terminating proximate one of the at least one fluid outlets.
A copper anode for an electrochemical plating cell, comprising:
Dependencies are inferred from the claim text.