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US 6,855,225 B1Granted
Single-tube interlaced inductively coupling plasma source
AssigneeNovellus Systems, Inc.
InventorsYuh-Jia Su, David Lee Chen, Vincent Bernard Decaux
Life of this patent
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Abstract
A plasma source for use in, for example, semiconductor processing contains a radio-frequency generator, an impedance matching network, and a coil that encloses a tube. The coil is bifilar, i.e., the turns of one are interlaced with the turns of a second winding. The matching network supplies only a single coil in the plasma source, unlike conventional arrangements wherein a single matching network supplies multiple coils in the plasma source.
Claims14
A plasma source comprising:
- a vessel for holding a plasma;
- a radio-frequency (RF) generator;
- a matching network supplied by the RF generator;
- and
- a coil supplied by the matching network, the coil enclosing the vessel and having a first end and a second end, the coil comprising:
- a plurality of windings comprising a first winding having a first end at said first end of said coil and a second end at said second end of said coil, and a second winding having a first end at said first end of said coil and a second end at said second end of said coil;
- individual turns of said first winding being interposed between individual turns of said second winding;
- and
- a return line connecting said second end of said first winding to said first end of said second winding.
6 more elements
A plasma source comprising:
- a radio-frequency (RF) generator;
- a vessel for holding a plasma;
- a matching network supplied by the RF generator;
- and
- a bifilar coil enclosing the vessel and having a first end and a second end, the coil comprising a plurality of windings comprising a first winding having a first end at said first end of said coil and a second end at said second end of said coil, and a second winding having a first end at said first end of said coil and a second end at said second end of said coil, the second end of the first winding being connected via a return line to the first end of the second winding;
- wherein said coil is supplied by said matching network and said matching network does not supply any other coil in said plasma source.
3 more elements
Dependencies are inferred from the claim text.