Hydrogen-selective silica-based membrane
AssigneesConocoPhillips Company, Virginia Polytechnic Institute and State University
InventorsShigeo Ted Oyama, Lixiong Zang, Doohwan Lee, Doug S. Jack
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Abstract
A hydrogen permselective membrane, a method of forming a permselective membrane and an apparatus comprising a permselective membrane, a porous substrate and an optional intermediate layer are described. Using chemical vapor deposition (CVD) at low reactant gas concentration, high permselectivities are achieved with minimal reduction in hydrogen permeance.
Claims47
A permselective asymmetric membrane comprising a surface layer and a porous substrate layer wherein said surface layer is deposited by the chemical vapor deposition of a CVD reactant gas having a concentration of less than 0.03 mole/m3 in a CVD gas stream wherein said deposition is carried out such that said membrane has a hydrogen permeance of at least 5×10−8 mol/m2·s·Pa and a permselectivity of at least 100 for hydrogen relative to argon.
A permselective asymmetric membrane comprising a surface layer, one or more porous intermediate layers and a porous substrate layer wherein said surface layer and at least one porous intermediate layer are deposited by chemical vapor deposition of a CVD reactant gas in a CVD gas stream, such that said membrane has a hydrogen permeance of at least 5×10−8 mol/m2·s·Pa and a permselectivity of at least 100 for hydrogen relative to argon.
A permselective asymmetric membrane comprising a surface layer and a porous substrate layer, said membrane having a permeance of at least 5×10−8 mol/m2·s·Pa for hydrogen and a permselectivity of at least 100 for hydrogen relative to argon.
A permselective asymmetric membrane comprising a surface layer and a porous substrate layer, said membrane having a permeance of at least 1×10−7 mol/m2·s·Pa for hydrogen and a permselectivity of at least 300 for hydrogen relative to argon.
Dependencies are inferred from the claim text.