Valve for a slurry outlet opening of a chemical mechanical polishing device and chemical mechanical polishing device having a valve
AssigneeInfineon Technologies AG
InventorsStefan Geyer, Andreas Fischer
Life of this patent
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Abstract
A valve for a slurry outlet opening in an installation for chemical mechanical polishing, in particular of semiconductor wafers in DRAM production, includes an elastic diaphragm, which covers the slurry outlet opening and has at least one self-closing opening. It is possible for the opening to be moved into a feedthrough position for the slurry by flowing slurry and to be automatically moved into a blocking position for the slurry when the slurry is not flowing. A CMP installation having such a valve is also provided. This creates a simple way of preventing particle agglomerations in the region of the fluid outlet opening of a CMP installation.
Claims18
A chemical mechanical polishing (CMP) installation, comprising:
- a slurry outlet opening;
- and
- a valve for said slurry outlet opening, said valve including:
- an elastic diaphragm covering the slurry outlet opening and having at least one self-closing opening, said at least one self-closing opening to be moved by flowing slurry into a feedthrough position for the slurry, and said at least one self-closing opening to be automatically moved into a blocking position for the slurry upon the slurry not flowing.
Dependencies are inferred from the claim text.