High contrast surface marking using irradiation of electrostatically applied marking materials

A thermally activated chemically based marking method comprising the steps of:

• electrostatically applying a layer of glass frit material containing an energy absorbing enhancer to a substrate selected from the group consisting of glass, ceramic, porcelain, aluminum, brass, steel, stainless steel and tin;
• and
• irradiating said layer with a beam having less than 20 watts of average power and a wavelength selected to excite the energy absorbing enhancer in accordance with the form of a marking to be applied, thereby forming a bonded and permanent marking layer atop the substrate which is visible in contrast with the substrate.

A thermally activated chemically based marking method comprising the steps of:

• electrostatically applying a layer of glass frit material optionally containing an energy absorbing enhancer to a substrate to be marked in the form of a marking to be applied;
• and
• irradiating said layer with a radiant energy beam having less than 20 watts of average power and a wavelength selected to excite the glass frit material and/or said energy absorbing enhancer, thereby forming a bonded and permanent marking layer atop the substrate which is visible in contrast with the substrate.