Replication and transfer of microstructures and nanostructures

A method for forming a pattern on a substrate, comprising:

• spin coating a polymer film onto a master comprising topographic patterns, such that the polymer film replicates the topographic structures of the master;
• transferring the polymer film to a carrier;
• aligning the carrier carrying the polymer film to a substrate which comprises a material to be patterned;
• transferring the polymer film to the substrate, in a manner such that the polymer film transfers the topographic pattern of the polymer film to the material to be patterned;
• and
• dissolving the polymer film while it is attached to the substrate.

A method for forming a patterned layer of material on a substrate, comprising

• preparation of a master with topographic structures in a layout that corresponds to a desired pattern;
• coating the master with a polymer film;
• curing the polymer film in a manner that forms topographic structures in the film that replicate at least a portion of the topographic patterns of the master;
• transferring the polymer film from the master to a carrier;
• processing the polymer film with a sequence of steps that leave solid materials on certain portions of the topographic structures of the polymer film that correspond to the desired pattern;
• aligning the polymer film with solid materials to a substrate;
• bringing the polymer film with solid materials and the substrate into close proximity;
• and
• transferring the solid materials from said certain portions on the polymer film to the substrate.