Photoresists, polymers and processes for microlithography

A photoresist comprising:

• (a) a fluorine-containing polymer comprising a repeat unit derived from a comonomer having the structure:
• wherein m is 0, 1 or 2;
• R1 to R8 are the same or different and each represents a hydrogen atom, a halogen atom, a carboxyl group, a hydrocarbon group of 1 to about 20 carbon atoms or a heteroatom substituted hydrocarbon group of 1 to about 20 carbon atom, the heteroatom being one or more oxygen atoms, nitrogen atoms or sulfur atoms;
• X is an oxygen atom or a direct bond;
• Rf is a straight chain or branched perfluoroalkyl group of from 1 to about 10 carbon atoms;
• and
• (b) a photoactive component,
• wherein the fluorine-containing polymer contains sufficient acid functionality to render the photoresist developable so as to produce relief images, upon imagewise exposure to ultraviolet radiation having a wavelength of ≦365 nm.

An article of manufacture comprising a substrate having coated thereon a photoresist comprising:

• (a) a fluorine-containing polymer comprising a repeat unit derived from a comonomer having the structure:
• wherein m is 0, 1 or 2;
• R1 to R8 are the same or different and each represents a hydrogen atom, a halogen atom, a carboxyl group, a hydrocarbon group of 1 to about 20 carbon atoms or a heteroatom substituted hydrocarbon group of 1 to about 20 carbon atom, the heteroatom being one or more oxygen atoms, nitrogen atoms or sulfur atoms;
• X is oxygen or a direct bond;
• Rf is a straight chain or branched perfluoroalkyl group of from 1 to 10 carbon atoms;
• and
• (b) a photoactive component,
• wherein the fluorine-containing polymer contains sufficient functionality to render the photoresist developable so as to produce relief images, upon imagewise exposure to ultraviolet radiation having a wavelength of ≦365 nm.