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US 6,849,374 B2Granted
Photoacid generators and photoresists comprising same
AssigneeShipley Company, L.L.C.
InventorsJames F. Cameron, Thomas M. Zydowsky
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Abstract
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an α,α-difluoroalkyl sulfonic acid upon exposure to activating radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are particularly preferred. The invention also includes methods for synthesis of such PAGs and α,α-difluoroalkyl sulfonic acids.
Claims15
A chemically-amplified positive-acting photoresist composition comprising:
- a) a resin that comprises photoacid-labile groups;
- and
- b) one or more photoacid generator compounds other than a N-oxyimidosulfonate that upon exposure to activating radiation generate an acid of the formula R(CR1R2)CF2SO3H
- where R is optionally substituted alkyl having 4 to about 20 carbon atoms, optionally substituted alicyclic group, optionally substituted carbocyclic aryl group, optionally substituted heteroalicyclic group, or optionally substituted heteroaromatic group, and R is not perhaloalkyl;
- and
- R1 and R2 are each independently hydrogen or non-hydrogen substituent.
3 more elements
Dependencies are inferred from the claim text.