Process control at an interconnect level
AssigneeAdvanced Micro Devices, Inc.
InventorsRobert J. Chong, Eric O. Green
Life of this patent
Estimating the term…
Abstract
A method and an apparatus for performing process control at an interconnect level. A process step upon a workpiece is performed. Manufacturing data relating to an interconnect location on the workpiece is acquired. An interconnect characteristic control process is performed based upon the manufacturing data. The interconnect characteristic control process includes controlling a process relating to a structure associated with the interconnect location on the workpiece to control a characteristic relating to the interconnect location.
Claims36
A method, comprising:
- performing a process step upon a workpiece;
- acquiring manufacturing data relating to an interconnect location on said workpiece;
- and
- performing an interconnect characteristic control process based upon said manufacturing data, said interconnect characteristic control process comprising controlling at least one of a barrier layer process, a pre-dielectric process, an ILD process, and a metal deposition process relating to a structure associated with said interconnect location on said workpiece to control a characteristic relating to said interconnect location.
A method, comprising:
- performing a process step upon a workpiece;
- acquiring metrology data relating to an interconnect location on said workpiece;
- and
- performing an interconnect characteristic control process based upon said metrology data, said interconnect characteristic control process comprising controlling at least one of a barrier layer process, a pre-dielectric process, an ILD process, end a metal deposition process to affect a resistance relating to said interconnect location.
An apparatus, comprising:
- means for performing a process stop upon a workpiece;
- means for acquiring manufacturing data relating to an interconnect location on said workpiece;
- and
- means for performing an interconnect characteristic control process based upon said manufacturing data, said interconnect characteristic control process comprising controlling at least one of a barrier layer process, a pre-dielectric process, an ILD process, and a metal deposition process relating to a structure associated with said interconnect location on said workpiece to control a characteristic relating to said interconnect location.
A system, comprising:
- a processing tool to process a workpiece;
- and
- a process controller operatively coupled to said processing tool, said process controller to perform an interconnect characteristic control process based upon manufacturing data relating to said workpiece, said interconnect characteristic control process comprising controlling at least one of a barrier layer process, a pre-dielectric process, an ILD process, and a metal deposition process relating to a structure associated with an interconnect location on said workpiece to control a characteristic relating to said interconnect location.
An apparatus, comprising:
- a process controller operatively adapted to control at least one of a barrier layer process, a pre-dielectric process, and ILD process, an a metal deposition process relating to a structure associated with an interconnect location on a workpiece for controlling a characteristic relating to said interconnect location.
A computer readable program storage device encoded with instructions that, when executed by a computer, performs a method, comprising:
- performing a process step upon a workpiece;
- acquiring manufacturing data relating to an interconnect location on said workpiece;
- and
- performing an interconnect characteristic control process based upon said manufacturing data, said interconnect characteristic control process comprising controlling at least one of a barrier layer process, a pre-dielectric process, an ILD process, and a metal deposition process relating to a structure associated with said interconnect location on said workpiece to control a characteristic relating to said interconnect location.
Dependencies are inferred from the claim text.