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US 6,842,657 B1Granted
Reactive formation of dielectric layers and protection of organic layers in organic semiconductor device fabrication
AssigneeE Ink Corporation
InventorsPaul S. Drzaic, Jianna Wang
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Abstract
In one embodiment of the invention, a method of manufacturing a semiconductor device comprises the steps of: a) providing an organic semiconductor layer; b) depositing a reactive species on a portion of the organic semiconductor layer; and c) reacting the reactive species with the portion of the organic layer to form a dielectric layer.
Claims7
A method of manufacturing a semiconductor device comprising the steps of:
- a) providing an organic semiconductor layer;
- b) depositing a reactive species on a portion of the organic semiconductor layer;
- and
- c) reacting the reactive species with the portion of the organic layer to form a dielectric layer.
1 more element
Dependencies are inferred from the claim text.