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US 6,842,229 B2Granted
Imprint lithography template comprising alignment marks
AssigneeBoard of Regents, The University of Texas System
InventorsSidlgata V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
Life of this patent
Estimating the term…
Abstract
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
Claims19
An imprint lithography template, said template comprising:
- template alignment marks that are substantially transparent to a first flux of light and that produce an analyzable mark in response to a second flux of light with said first flux of light differing from said second flux of light.
An imprint lithography template, said template comprising:
- template alignment marks, with said template substantially transparent to a first flux of light and said template alignment marks producing an analyzable mark in response to a second flux of light with said first flux of light differing from said second flux of light.
An imprint lithography template, said template comprising:
- template alignment marks that are substantially transparent to ultraviolet light and that produce an analyzable mark in response to visible light.
Dependencies are inferred from the claim text.