Substrate processing apparatus equipping with high-pressure processing unit

A substrate processing apparatus including a main transportation path, comprising:

• a plurality of wet processing units each of which is disposed facing said main transportation path, and each of which supplies a processing fluid to a substrate to process said substrate with a predetermined wet surface treatment, one of said wet processing units being a preprocessing unit;
• a main transportation system which moves on said main transportation path, and which loads a substrate into and unloads a substrate out from said wet processing units;
• a high-pressure processing unit which is disposed away from said main transportation path with said preprocessing unit located between said main transportation path and said high-pressure processing unit, and which causes a high-pressure fluid or a mixture of a high-pressure fluid and a chemical agent, as a processing fluid, to come into contact with a surface of a substrate treated with said wet surface treatment by said preprocessing unit and accordingly processes a surface of said substrate with a high-pressure surface treatment;
• and
• a dedicated transportation system which is disposed between said preprocessing unit and said high-pressure processing unit, and which transports a substrate from said preprocessing unit to said high-pressure processing unit.

A substrate processing apparatus including a main transportation path, comprising:

• a plurality of wet processing units each of which is disposed facing said main transportation path, and each of which supplies a processing fluid to a substrate to process said substrate with a predetermined wet surface treatment;
• a main transportation system which moves on said main transportation path, and which loads a substrate into and unloads a substrate out from said wet processing units;
• a plurality of high-pressure processing units each of which is disposed away from said main transportation path with one said wet processing unit located between said main transportation path and said high-pressure processing unit, and each of which causes a high-pressure fluid or a mixture of a high-pressure fluid and a chemical agent, as a processing fluid, to come into contact with a surface of a substrate treated with said wet surface treatment by said one wet processing unit and accordingly processes a surface of said substrate with a high-pressure surface treatment;
• and
• a dedicated transportation system which is disposed between said one wet processing unit and the corresponding said high-pressure processing unit, and which transports a substrate from said one wet processing unit to said corresponding high-pressure processing unit,
• wherein said high-pressure processing units are disposed in juxtaposition.