MEMS element manufacturing method
AssigneeSony Corporation
InventorsKoichi Ikeda, Takashi Kinoshita
Life of this patent
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Abstract
The present invention is directed to manufacturing methods of electrostatic type MEMS devices. The manufacturing method of the present invention includes the steps of forming a substrate side electrode on a substrate, forming a fluid film before or after forming a sacrificial layer, further forming a beam having a driving side electrode on a planarized surface of the fluid film, and finally, removing the sacrificial layer. Furthermore, performing the foregoing method planarizes the surface of a driving side electrode, reduces fluctuations in the shape of a beam, and improves the performance and the uniformity of the MEMS device.
Claims2
A manufacturing method of a MEMS device, comprising the steps of:
- forming a substrate side electrode on a substrate;
- forming a support member detached from said substrate side electrode on said substrate;
- forming a sacrificial layer on said substrate side electrode so that said sacrificial layer and said support member form a continuous surface;
- forming a fluid film on said continuous surface;
- forming a driving side electrode on said fluid film;
- and
- removing said sacrificial layer so that said driving side electrode and said fluid film form a planarized beam, wherein said fluid film is a silicate glass formed of a silicate glass film including phosphor, boron, or the both, and after forming the silicate glass film by heat treatment, planarizing a surface of said silicate glass film.
A manufacturing method of a MEMS device, comprising the steps of:
- forming a substrate side electrode on a substrate;
- forming a support member on said substrate;
- forming a sacrificial layer on said substrate side electrode and adjacent to said support member;
- forming a fluid film on said sacrificial layer and said support member;
- forming a driving side electrode on said fluid film;
- and
- removing said sacrificial layer so that said driving side electrode and said fluid film form a planarized beam, wherein said fluid film is a silicate glass formed of a silicate glass film including phosphor, boron, or the both, and after forming the silicate glass film by heat treatment, planarizing a surface of said silicate glass film.
Dependencies are inferred from the claim text.