Electro-optical device and manufacturing method thereof

A method of manufacturing an electro-optical device, said method comprising the steps of:

• forming a plurality of TFTs over a substrate;
• forming a plurality of pixel electrodes each being connected to one of the plurality of TFTs;
• and
• forming an EL layer over the plurality of pixel electrodes,
• wherein the EL layer is formed by an ink-jet method,
• wherein the EL layer has an oblong shape or a rectangular shape corresponding to each of the plurality of pixel electrodes,
• wherein the electro-optical device includes a plurality of pixels,
• wherein each of the plurality of pixels includes pixel electrodes adjacent each other, and
• wherein a gap between one pixel and an adjacent pixel thereof is in a range of 5 to 10 times of a thickness of the EL layer.

A method of manufacturing an electro-optical device, said method comprising the steps of:

• forming a plurality of TFTs over a substrate;
• forming a plurality of pixel electrodes each being connected to one of the plurality of TFTs;
• forming first EL layers for emitting a red color light over first pixel electrodes in the plurality of pixel electrodes;
• forming second EL layers for emitting a green color light over second pixel electrodes in the plurality of pixel electrodes;
• and
• forming third EL layers for emitting a blue color light over third pixel electrodes in the plurality of pixel electrodes,
• wherein the first, second and third EL layers are formed by an ink-jet method,
• wherein the first, second and third EL layers are continuous over the plurality of pixel electrodes,
• wherein the electro-optical device includes a plurality of pixels,
• wherein each of the plurality of pixels includes pixel electrodes adjacent each other, and
• wherein a gap between one pixel and an adjacent pixel thereof is in a range of 5 to 10 times of a thickness of each of the first, second and third EL layers.

A method of manufacturing an electro-optical device, said method comprising the steps of:

• forming a plurality of TFTs over a substrate;
• forming a plurality of pixel electrodes each being connected to one of the plurality of TFTs;
• forming first EL layers for emitting a red color light over first pixel electrodes in the plurality of pixel electrodes;
• forming second EL layers for emitting a green color light over second pixel electrodes in the plurality of pixel electrodes;
• and
• forming third EL layers for emitting a blue color light over third pixel electrodes in the plurality of pixel electrodes,
• wherein the first, second and third EL layers are formed by an ink-jet method,
• wherein each of the first, second and third EL layers has an oblong shape or a rectangular shape corresponding to each of the plurality of pixel electrodes,
• wherein the electro-optical device includes a plurality of pixels,
• wherein each of the plurality of pixels includes pixel electrodes adjacent each other, and
• wherein a gap between one pixel and an adjacent pixel thereof is in a range of 5 to 10 times of a thickness of each of the first, second and third EL layers.

A method of manufacturing an electro-optical device, said method comprising the steps of:

• forming a plurality of TFTs over a substrate;
• forming an insulating layer covering the plurality of TFTs;
• forming a plurality of pixel electrodes each being connected to one of the plurality of TFTs;
• and
• forming an EL layer over the plurality of pixel electrodes,
• wherein the EL layer is formed by an ink-jet method,
• wherein the EL layer is continuous over the plurality of pixel electrodes,
• wherein an insulating film for preventing transmission of alkali metals is formed in a top layer of the insulating layer,
• wherein the electro-optical device includes a plurality of pixels,
• wherein each of the plurality of pixels includes pixel electrodes adjacent each other, and
• wherein a gap between one pixel and an adjacent pixel thereof is in a range of 5 to 10 times of a thickness of the EL layer.

A method of manufacturing an electro-optical device, said method comprising the steps of:

• forming a plurality of TFTs over a substrate;
• forming an insulating layer covering the plurality of TFTs;
• forming a plurality of pixel electrodes each being connected to one of the plurality of TFTs;
• and
• forming an EL layer on the plurality of pixel electrodes,
• wherein the EL layer is formed by an ink-jet method,
• wherein the EL layer has an oblong shape or a rectangular shape corresponding to each of the plurality of pixel electrodes,
• wherein an insulating film for preventing transmission of alkali metals is formed in a top layer of the insulating layer,
• wherein the electro-optical device includes a plurality of pixels,
• wherein each of the plurality of pixels includes pixel electrodes adjacent each other, and
• wherein a gap between one pixel and an adjacent pixel thereof is in a range of 5 to 10 times of a thickness of the EL layer.

A method of manufacturing an electro-optical device, said method comprising the steps of:

• forming a plurality of TFTs over a substrate;
• forming an insulating layer covering the plurality of TFTs;
• forming a plurality of pixel electrodes each being connected to one of the plurality of TFTs;
• forming first EL layers for emitting a red color light over first pixel electrodes in the plurality of pixel electrodes;
• forming second EL layers for emitting a green color light over second pixel electrodes in the plurality of pixel electrodes;
• and
• forming third EL layers for emitting a blue color light over third pixel electrodes in the plurality of pixel electrodes,
• wherein the first, second and third EL layers are formed by an ink-jet method,
• wherein the first, second and third EL layers are continuous over the plurality of pixel electrodes,
• wherein an insulating film for preventing transmission of alkali metals is formed in a top layer of the insulating layer,
• wherein the electro-optical device includes a plurality of pixels,
• wherein each of the plurality of pixels includes pixel electrodes adjacent each other, and
• wherein a gap between one pixel and an adjacent pixel thereof is in a range of 5 to 10 times of a thickness of each of the first, second and third EL layers.

A method of manufacturing an electro-optical device, said method comprising the steps of:

• forming a plurality of TFTs over a substrate;
• forming an insulating layer covering the plurality of TFTs;
• forming a plurality of pixel electrodes each being connected to one of the plurality of TFTs;
• forming first EL layers for emitting a red color light over first pixel electrodes in the plurality of pixel electrodes;
• forming second EL layers for emitting a green color light over second pixel electrodes in the plurality of pixel electrodes;
• and
• forming third EL layers for emitting a blue color light over third pixel electrodes in the plurality of pixel electrodes,
• wherein the first, second and third EL layers are formed by an ink-jet method,
• wherein each of the first, second and third EL layers has have an oblong shape or a rectangular shape corresponding to each of the plurality of pixel electrodes,
• wherein an insulating film for preventing transmission of alkali metals is formed in a top layer of the insulating layer,
• wherein the electro-optical device includes a plurality of pixels,
• wherein each of the plurality of pixels includes pixel electrodes adjacent each other, and
• wherein a gap between one pixel and an adjacent pixel thereof is in a range of 5 to 10 times of a thickness of each of the first, second and third EL layers.