Semiconductor device and method of manufacturing the same

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• simultaneously forming one, or more, trench(es) and a trench of a dotted line form that is located along the outside of said one, or more, trench(es) wherein a plurality of first holes is arranged at intervals in a predetermined direction and that, thereby, has a surface pattern of a dotted line form in said first main surface;
• and
• simultaneously forming said low concentration region in the sidewall on one side of said trench of a dotted line form and said other first and second impurity regions in the sidewalls on one side of said one, or more, trenches by simultaneously carrying out an ion implantation in the sidewalls on one side of the respective trenches of said one, or more, trench and said trench of a dotted line form.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• creating two, or more, trenches in the first main surface of said semiconductor substrate;
• ion implantation of impurities into the sidewalls on one side of said two, or more, trenches in order to form said first or second impurity regions;
• and
• forming said low concentration region by carrying out an ion implantation of impurities of a conductive type opposite to that of the already implanted impurities in the sidewall on one side of said trench located at the outermost portion under the condition wherein said two, or more, trenches except the trench located at the outermost portion are filled in with a filling layer so that the concentration of the already implanted impurities is substantially lowered.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• creating one, or more, trench(es) in a first main surface of said semiconductor substrate;
• ion implantation of a first implantation amount for forming said first of second impurity region in the sidewalls on one side of said one, or more, trenches;
• creating a new trench at the outermost portion outside of said one, or more, trench(es) under the condition wherein each of said one, or more, trench(es) is filled in with a filling layer;
• and
• ion implantation of a second implantation amount that is smaller than said first implantation amount for forming said low concentration region in the sidewall on one side of said trench at the outermost portion.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• simultaneously creating two, or more, trenches including first and second trenches adjoining each other in a first main surface of said semiconductor substrate and a trench of a dotted line form having a surface pattern of a dotted line form in said first main surface by arranging a plurality of first holes at intervals in a predetermined direction so as to be located along the outside of said two, or more, trenches;
• ion implantation of first impurities for forming said first impurity region in each of the sidewalls on both sides of said first trench;
• and
• ion implantation of second impurities for forming said second impurity region in each of the sidewalls on both sides of said second trench, wherein
• said low concentration regions are created in the sidewalls on both sides of said trench of a dotted line through implantation at the same time of the ion implantation of said first or second impurities.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• creating a first group of trenches made of a plurality of first trenches in a first main surface of said semiconductor substrate;
• ion implantation into each of the sidewalls on both sides of said first trenches for forming said first impurity regions;
• creating a second group of trenches made of a plurality of second trenches in said first main surface so that said first trenches and said second trenches are positioned in an alternating manner;
• ion implantation in each of the sidewalls on both sides of said second trenches for forming said second impurity regions;
• implanting ions of a conductive type opposite to that of the already implanted impurities in the sidewalls on both sides of said trench located at the outermost portion under the condition wherein said first and second trenches arranged in an alternating manner except the trench located at the outermost portion are filled in with a filling layer so as to form said low concentration regions by substantially lowering the concentration of the already implanted impurities.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• creating a first group of trenches made of a plurality of first trenches in a first main surface of said semiconductor substrate;
• ion implantation for forming said first impurity regions in the sidewalls on both sides of each of said first trenches;
• creating a second group of trenches made of a plurality of second trenches in said first main surface in the condition that each of said first trenches is filled in with a filling layer so that said first trenches and said second trenches are alternately located;
• ion implantation for forming said second impurity regions in the sidewalls on both sides of each of said second trenches;
• creating a new trench at the outermost portion outside of the trench located at the outermost portion of said first and second trenches that are arranged in an alternating manner under the condition wherein each of said first and second trenches is filled in with a filling layer;
• and
• forming said low concentration region of which the impurity concentration is lower than that of said first or second impurity regions by implanting impurity ions of said first or second conductive type into the sidewalls on both sides of said trench at the outermost portion.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are fanned so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• simultaneously creating a first group of trenches made of a plurality of first trenches and a second group of trenches made of a plurality of second trenches in a first main surface of said semiconductor substrate so that said first trenches and said second trenches are alternately located;
• ion implantation for forming said first impurity regions into the sidewalls on both sides of each of said plurality of first trenches forming said first group of trenches under a condition wherein said second group of trenches is filled in with a first filling layer;
• ion implantation for fanning said second impurity regions into the sidewalls on both sides of each of said plurality of second trenches forming said second group of trenches under a condition wherein said first group of trenches is filled in with a second filling layer;
• forming said low concentration regions by implanting impurity ions of a conductive type opposite to that of the already implanted impurities into the sidewalls on both sides of said trench at the outermost portion so that the concentration of the already implanted impurities is lowered under the condition wherein all the trenches of said plurality of first trenches forming said first group of trenches and of said plurality of second trenches forming said second group of trenches except the trench at the outermost portion located in the outermost portion.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• simultaneously creating a first group of trenches made of a plurality of first trenches and a second group of trenches made of a plurality of second trenches in a first main surface of said semiconductor substrate so that said first trenches and said second trenches are alternately located;
• ion implantation for forming said first impurity regions into the sidewalls on both sides of each of said plurality of first trenches forming said first group of trenches under a condition wherein said second group of trenches is filled in with a first filling layer;
• and
• ion implantation for forming said second impurity regions into the sidewalls on both sides of each of said plurality of second trenches forming said second group of trenches under a condition wherein said first group of trenches is filled in with a second filling layer, wherein
• the trench at the outermost portion located at the outermost portion from among said plurality of first trenches forming said first group of trenches and said plurality of second trenches forming said second group of trenches is a trench of a dotted line form having a surface pattern of a dotted line form wherein a plurality of holes is arranged at intervals in a predetermined direction in said first main surface.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• creating two, or more, trenches in a first main surface of said semiconductor substrate;
• ion implantation of impurities into the sidewalls on one side of said two, or more, trenches for forming said first or second impurity regions;
• and
• ion implantation of impurities of the same conductive type as that of the already implanted impurities into the sidewalls on one side of the trenches other than said trench located at the outermost portion under the condition wherein the trench located at the outermost portion from among said two, or more, trenches is filled in with a filling layer and, thereby, the concentration of the already implanted impurities is substantially increased so that said first or second impurity region in the sidewall of said trench located at the outermost portion becomes a region of a comparatively low concentration.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently changed concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• creating a first group of trenches made of a plurality of first trenches in a first main surface of said semiconductor substrate;
• ion implantation for forming said first impurity regions in the sidewalls on both sides of each of said first trenches;
• creating a second group of trenches made of a plurality of second trenches in said first main surface so that said first trenches and said second trenches are arranged in an alternating manner;
• ion implantation for forming said second impurity regions in the sidewalls on both sides of each of said second trenches;
• ion implantation of impurities of the same conductive type as that of the already implanted impurities into the sidewalls on both sides of the trenches other than said trench located at the outermost portion under the condition wherein the trench located at the outermost portion from among said first and second trenches arranged in an alternating manner is filled in with a filling layer and, thereby, the concentration of the already implanted impurities is substantially increased so that said first or second impurity region in the sidewall of said trench located at the outermost portion becomes a region of a comparatively low concentration.

A manufacturing method for a semiconductor device having a structure wherein a structure where a first impurity region of a first conductive type and a second impurity region of a second conductive type are aligned side by side is repeated twice or more in a semiconductor substrate of the first conductive type, characterized in that

• a low concentration region that is either said first or second impurity region located at the outermost portion of said repeating structure and said first and second impurity regions, other than the low concentration region, are formed so as to have independently chanted concentrations so that said low concentration region has the lowest impurity concentration or has the least generally effective charge amount among all of said first and second impurity regions forming said repeating structure, and characterized by further comprising the steps of:
• simultaneously creating a first group of trenches made of a plurality of first trenches and a second group of trenches made of a plurality of second trenches in a first main surface of said semiconductor substrate so that said first trenches and said second trenches are alternately located;
• ion implantation for forming said first impurity regions into the sidewalls on both sides of each of said plurality of first trenches forming said first group of trenches under a condition wherein said second group off trenches is filled in with a first filling layer;
• ion implantation for forming said second impurity regions into the sidewalls on both sides of each of said plurality of second trenches forming said second group of trenches under a condition wherein said first group of trenches is filled in with a second filling layer;
• implanting impurity ions of the seine conductive type as that of the already implanted impurities into the sidewalls on both sides of the trenches other than said trench at the outermost portion under the condition wherein the trench at the outermost portion, located at the outermost portion, from among said plurality of first trenches forming said first group of trenches and said plurality of second trenches forming said second group of trenches is filled in with a third filling layer so as to increase the concentration of the already implanted impurities so that said first or second impurity regions of the sidewalls of the trench at the outermost portion become regions of a comparatively low concentration.